The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2019
Filed:
Jun. 15, 2017
Asml Netherlands B.v., Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Marco Koert Stavenga, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Jan Cornelis Van Der Hoeven, Veldhoven, NL;
Cedric Desire Grouwstra, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.