The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2019
Filed:
Jun. 13, 2017
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Ravi Pokhrel, Framingham, MA (US);
Matthew Thorseth, Midland, MI (US);
James Byrnes, Somerville, MA (US);
Mark Scalisi, Salem, NH (US);
Zuhra Niazimbetova, Westborough, MA (US);
Joanna Dziewiszek, Boxborough, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 3/38 (2006.01); C25D 3/52 (2006.01); C25D 5/22 (2006.01); C25D 7/12 (2006.01); H05K 3/20 (2006.01);
U.S. Cl.
CPC ...
C25D 3/38 (2013.01); C25D 3/52 (2013.01); C25D 5/22 (2013.01); C25D 7/123 (2013.01); H05K 3/205 (2013.01);
Abstract
Electroplating methods enable the plating of photoresist defined features which have substantially uniform morphology. The electroplating methods include copper electroplating baths with reaction products of pyrazole compounds and bisepoxides to electroplate the photoresist defined features. Such features include pillars, bond pads and line space features.