The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Jan. 19, 2017
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Stephen Dale Coomer, Chandler, AZ (US);
Robert Vyne, Chandler, AZ (US);
Timo Bergman, Scottsdale, AZ (US);
Lee Bode, Chandler, AZ (US);
Wentao Wang, Phoenix, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C30B 25/14 (2006.01); C30B 25/16 (2006.01);
U.S. Cl.
CPC ...
C30B 25/14 (2013.01); C23C 16/45561 (2013.01); C23C 16/45582 (2013.01); C23C 16/45587 (2013.01); C30B 25/165 (2013.01);
Abstract
A gas distribution system is disclosed in order to obtain better film uniformity on a wafer. The better film uniformity may be achieved by utilizing an expansion plenum and a plurality of, for example, proportioning valves to ensure an equalized pressure or flow along each gas line disposed above the wafer.