The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Dec. 02, 2015
Atotech Deutschland Gmbh, Berlin, DE;
Toshia Fujiwara, Tokyo, JP;
Horst Brüggmann, Berlin, DE;
Roland Herold, Berlin, DE;
Thomas Schiwon, Berlin, DE;
Atotech Deutschland GmbH, Berlin, DE;
Abstract
Method for electroplating a metal onto a flat substrate P. Surfaces are electrically polarized for metal deposition by feeding thereto at least one first and second forward-reverse pulse current sequences. The first forward-reverse pulse current sequence includes a first forward pulse generating a first cathodic current during a first forward pulse duration tand having a first forward pulse peak current i, and a first reverse pulse generating a first anodic current during a first reverse pulse duration tand having a first reverse pulse peak current i, the second forward-reverse pulse current sequence including a second forward pulse generating a second cathodic current during a second forward pulse duration tand having a second forward pulse peak current i, and a second reverse pulse generating a second anodic current during a second reverse pulse duration t, the second reverse pulse having a second reverse pulse peak current i.