The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Apr. 23, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Wei Fang, Milpitas, CA (US);
Kevin Liu, Fremont, CA (US);
Fei Wang, Santa Clara, CA (US);
Jack Jau, Los Altos Hills, CA (US);
Zhaohui Guo, San Jose, CA (US);
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/06 (2006.01); H01J 37/22 (2006.01); H01J 37/304 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/06 (2013.01); H01J 37/222 (2013.01); H01J 37/3045 (2013.01); H01J 2237/202 (2013.01); H01J 2237/2826 (2013.01); H01L 22/12 (2013.01);
Abstract
A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.