The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Nov. 13, 2017
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Chao Fang, Milpitas, CA (US);

Mark D. Smith, San Jose, CA (US);

Brian Duffy, San Jose, CA (US);

Assignee:

KLA Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G01B 21/02 (2006.01); G06T 7/00 (2017.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G01B 21/02 (2013.01); G03F 7/705 (2013.01); G03F 7/70616 (2013.01); G06T 7/001 (2013.01); G06T 7/0004 (2013.01); G06F 2217/82 (2013.01); G06T 2200/04 (2013.01); G06T 2200/08 (2013.01); G06T 2207/20076 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A metrology system includes a controller communicatively coupled to a metrology tool. The controller may generate a three-dimensional model of a sample, generate a predicted metrology image corresponding to a predicted analysis of the sample with the metrology tool based on the three-dimensional model, evaluate two or more candidate metrology recipes for extracting the metrology measurement from the one or more predicted metrology images, select, based on one or more selection metrics, a metrology recipe from the two or more candidate metrology recipes for extracting a metrology measurement from an image of the structure from the metrology tool, receive an output metrology image of a fabricated structure from the metrology tool based on a metrology measurement of the fabricated structure, and extract the metrology measurement associated with the fabricated structure from the output metrology image based on the metrology recipe.


Find Patent Forward Citations

Loading…