The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Jun. 08, 2016
Ulvac, Inc., Kanagawa, JP;
Tetsushi Fujinaga, Chigasaki, JP;
Atsuhito Ihori, Chigasaki, JP;
Masahiro Matsumoto, Chigasaki, JP;
Noriaki Tani, Chigasaki, JP;
Harunori Iwai, Chigasaki, JP;
Kenji Iwata, Chigasaki, JP;
Yoshinao Sato, Chigasaki, JP;
ULVAC, INC., Kanagawa, JP;
Abstract
A substrate processing device includes a housing connected to ground, a cathode stage that supports a substrate, an anode unit, and a gas feeding unit that feeds gas toward the first plate. The cathode stage is applied with voltage for generating plasma. The anode unit includes a first plate including first through holes and a second plate including second through holes that are larger than the first through holes. The second plate is located between the first plate and the cathode stage. The first plate produces a flow of the gas through the first through holes. The gas that has passed through the first through holes flows through the second through holes into an area between the second plate and the cathode stage. A distance between the first plate and the second plate is 10 mm or greater and 50 mm or less.