The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Aug. 28, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Bastiaan Onne Fagginger Auer, Eindhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Mariya Vyacheslavivna Medvedyeva, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7076 (2013.01); G03F 7/70141 (2013.01); G03F 7/70616 (2013.01); G03F 7/70683 (2013.01); G03F 9/7042 (2013.01); G03F 9/7088 (2013.01);
Abstract
A target formed on a substrate, the target having: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat pattern that appears in an image of the target allows the target to be easily identified using a pattern recognition technique.