The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Mar. 09, 2017
Mitsui Chemicals, Inc., Minato-ku, Tokyo, JP;
Kazuo Kohmura, Chiba, JP;
Daiki Taneichi, Otake, JP;
Yosuke Ono, Sodegaura, JP;
Hisako Ishikawa, Ichihara, JP;
Tsuneaki Biyajima, Otake, JP;
Atsushi Okubo, Tokyo, JP;
Yasuyuki Sato, Ibara, JP;
Toshiaki Hirota, Ibara, JP;
MITSUI CHEMICALS, INC., Minato-Ku, Tokyo, JP;
Abstract
Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.