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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10486285 B1

PDFFull Text
Date of Patent:
Nov. 26, 2019

Filed:

May. 22, 2017

Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method

Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Mitsuru Miyazaki, Tokyo, JP;

Seiji Katsuoka, Tokyo, JP;

Naoki Matsuda, Tokyo, JP;

Junji Kunisawa, Tokyo, JP;

Kenichi Kobayashi, Tokyo, JP;

Hiroshi Sotozaki, Tokyo, JP;

Hiroyuki Shinozaki, Tokyo, JP;

Osamu Nabeya, Tokyo, JP;

Shinya Morisawa, Tokyo, JP;

Takahiro Ogawa, Tokyo, JP;

Natsuki Makino, Tochigi, JP;

Assignee:

EBARA Corporation, Tokyo, JP;

Attorney:

Baker & Hostetler LLP

Primary Examiner:

Dung Van Nguyen

Int. Cl.
CPC ...
B24B 37/34 (2012.01); H01L 21/677 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B24B 37/345 (2013.01); H01L 21/30625 (2013.01); H01L 21/67219 (2013.01); H01L 21/67739 (2013.01); H01L 21/67742 (2013.01); H01L 21/67754 (2013.01); Y10T 137/0318 (2015.04); Y10T 137/8593 (2015.04);
Abstract

An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

Find Patent Forward Citations

Miyazaki, Mitsuru. (2019). Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method (U.S. Patent No. 10486285). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10486285

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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