The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2019

Filed:

Aug. 22, 2017
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Riteshkumar Bhojani, Chemnitz, DE;

Franz-Josef Niedernostheide, Hagen a. T.W., DE;

Hans-Joachim Schulze, Taufkirchen, DE;

Josef Lutz, Chemnitz, DE;

Roman Baburske, Otterfing, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 27/02 (2006.01); H01L 29/36 (2006.01); H03K 17/16 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7393 (2013.01); H01L 27/0222 (2013.01); H01L 29/0619 (2013.01); H01L 29/0696 (2013.01); H01L 29/0834 (2013.01); H01L 29/36 (2013.01); H01L 29/7397 (2013.01); H03K 17/16 (2013.01);
Abstract

A transistor device includes a first emitter region of a first doping type, a second emitter region of a second doping type, a body of the second doping type, a drift region of the first doping type, a field-stop region of the first doping type, at least one boost structure, and a gate electrode. The boost structure is arranged between the field-stop region and the second emitter region. The at least one boost structure includes a base region of the first doping type and at least one auxiliary emitter region of the second doping type separated from the second emitter region by the base region. An overall dopant dose in the drift region and the field-stop region in a current flow direction of the transistor device is higher than a breakthrough charge of a semiconductor material of the drift region and the field-stop region.


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