The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
Mar. 20, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Takahiro Miyahara, Nirasaki, JP;
Hiroki Murakami, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/324 (2006.01); H01L 21/02 (2006.01); H01L 21/28 (2006.01); H01L 21/265 (2006.01); H01L 29/66 (2006.01); C23C 16/46 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); H01L 29/786 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/324 (2013.01); C23C 16/45519 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); H01L 21/0228 (2013.01); H01L 21/0262 (2013.01); H01L 21/02178 (2013.01); H01L 21/02181 (2013.01); H01L 21/02186 (2013.01); H01L 21/02189 (2013.01); H01L 21/02192 (2013.01); H01L 21/02271 (2013.01); H01L 21/02312 (2013.01); H01L 21/02381 (2013.01); H01L 21/02488 (2013.01); H01L 21/02532 (2013.01); H01L 21/02664 (2013.01); H01L 21/26513 (2013.01); H01L 21/28088 (2013.01); H01L 21/28158 (2013.01); H01L 29/66477 (2013.01); H01L 29/786 (2013.01); C23C 16/40 (2013.01);
Abstract
There is provided heating method for heating a substrate having a germanium film or a silicon germanium film formed on a surface of the substrate, the method including: loading the substrate kept in an air atmosphere at least a predetermined time into a processing container; and heating the substrate in a state in which an interior of the processing container is kept in a hydrogen gas-containing atmosphere.