The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
Feb. 04, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Guoheng Zhao, Palo Alto, CA (US);
Jeremy Rolfe Nesbitt, San Jose, CA (US);
Christopher Dennis Bencher, Cupertino, CA (US);
Mehdi Vaez-Iravani, Los Gatos, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
The present disclosure generally relates to lithography devices comprising an autofocus system. The autofocus system is configured to individually focus and adjust a plurality of digital micromirror devices. The autofocus system comprises a single light beam and a diffractive optical element configured to split the single light beam into two or more split beams. The two or more split beams are directed to a beam splitter. The two or more split beams are then reflected off the surface of a substrate to at least one position sensor. The position sensor is configured to measure the position of each of the two or more split beams. At least one digital micromirror device is then individually adjusted based on the measured position to adjust the focus of the at least one digital micromirror device with respect to surface height and tilt variations of the substrate.