The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

Aug. 26, 2016
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Young-Sik Ghim, Sejong, KR;

Hyug-Gyo Rhee, Daejeon, KR;

Yun Woo Lee, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G01B 11/06 (2006.01); G06F 17/16 (2006.01); G06F 17/17 (2006.01); G01B 11/24 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02041 (2013.01); G01B 9/02015 (2013.01); G01B 9/02062 (2013.01); G01B 11/0625 (2013.01); G01B 11/0675 (2013.01); G01B 11/2441 (2013.01); G06F 17/16 (2013.01); G06F 17/17 (2013.01);
Abstract

The present disclosure relates to an apparatus for measuring a thickness and a surface profile of a multilayered film structure using an imaging spectral optical system and a measuring method. More specifically, the present disclosure relates to a method and an apparatus which measure a thickness and a surface profile of a multilayered thin film structure by applying a method for obtaining an absolute reflectance value for an object to be measured having a multilayered thin film using a reflected light measuring method and extracting a phase from an interference signal with a reference mirror using a phase shift algorithm.


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