The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2019

Filed:

Nov. 15, 2017
Applicant:

Sandisk Technologies Llc, Plano, TX (US);

Inventors:

Senaka Krishna Kanakamedala, San Jose, CA (US);

Yoshihiro Kanno, Yokkaichi, JP;

Raghuveer S. Makala, Campbell, CA (US);

Yanli Zhang, San Jose, CA (US);

Jin Liu, San Jose, CA (US);

Murshed Chowdhury, Fremont, CA (US);

Yao-Sheng Lee, Tampa, FL (US);

Assignee:

SANDISK TECHNOLOGIES LLC, Addison, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 27/11556 (2017.01); H01L 27/11582 (2017.01); H01L 29/49 (2006.01); H01L 29/66 (2006.01); H01L 23/522 (2006.01);
U.S. Cl.
CPC ...
H01L 29/42372 (2013.01); H01L 23/5226 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01); H01L 29/4958 (2013.01); H01L 29/6656 (2013.01); H01L 29/66825 (2013.01); H01L 29/66833 (2013.01);
Abstract

A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a substrate. Memory stack structures are located in a memory array region, each of which includes a memory film and a vertical semiconductor channel. Contact via structures located in the terrace region and contact a respective one of the electrically conductive layers. Each of the electrically conductive layers has a respective first thickness throughout the memory array region and includes a contact portion having a respective second thickness that is greater than the respective first thickness within a terrace region. The greater thickness of the contact portion prevents an etch-through during formation of contact via cavities for forming the contact via structures.


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