The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2019
Filed:
May. 09, 2018
United Microelectronics Corp., Hsin-Chu, TW;
Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, Fujian Province, CN;
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, Fujian Province, CN;
Abstract
A patterning method includes the following steps. A second mask layer is formed on a first mask layer. A patterning process is performed to the first mask layer and the second mask layer. The first mask layer is patterned to be a first mask pattern, and the second mask layer is patterned to be a second mask pattern formed on the first mask pattern. A first trim process is performed to the second mask pattern. A width of the second mask pattern is smaller than a width of the first mask pattern after the first trim process. A cover layer is formed covering the first mask pattern and the second mask pattern after the first trim process, and an etching process is performed to the first mask pattern after the step of forming the cover layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile