The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2019
Filed:
Jun. 01, 2018
Applicant:
Globalwafers Co., Ltd., Hsinchu, TW;
Inventors:
Qingmin Liu, Glen Carbon, IL (US);
William Lynn Luter, St. Charles, MO (US);
Shawn George Thomas, Chesterfield, MO (US);
Assignee:
GlobalWafters Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D 5/00 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
F27D 5/0037 (2013.01); H01L 21/67109 (2013.01); H01L 21/67309 (2013.01); H01L 21/68721 (2013.01); H01L 21/6875 (2013.01);
Abstract
A support ring for supporting a semiconductor wafer in a boat of a vertical furnace used in processing of the semiconductor wafer includes a semicircular segment. The semicircular segment has an upper surface, a lower surface opposite the upper surface, a radial inner wall defining an inner radius, and a radial outer wall defining an outer radius. The support ring further includes protrusions in the upper surface of the semicircular segment. The protrusions extend above the upper surface.