The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2019

Filed:

Mar. 08, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Yan Chen, Cupertino, CA (US);

Xinkang Tian, Fremont, CA (US);

Jason Ferns, Sunnyvale, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32009 (2013.01); H01J 37/32917 (2013.01); H01J 37/32963 (2013.01); H01J 37/32972 (2013.01); H01L 21/3065 (2013.01); H01L 21/30655 (2013.01); H01J 2237/334 (2013.01); H01L 22/26 (2013.01);
Abstract

Described herein are architectures, platforms and methods for determining endpoints of an optical emission spectroscopy (OES) data acquired from a plasma processing system. The OES data, for example, includes an absorption—step process, a desorption—step process, or a combination thereof. In this example, the OES data undergoes signal synchronization and transient signal filtering prior to endpoint determination, which may be implemented through an application of a moving average filter.


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