The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2019

Filed:

Jul. 04, 2018
Applicants:

United Microelectronics Corp., Hsin-Chu, TW;

Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, Fujian Province, CN;

Inventors:

Feng-Yi Chang, Tainan, TW;

Fu-Che Lee, Taichung, TW;

Chieh-Te Chen, Kaohsiung, TW;

Assignees:

UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;

Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, Fujian Province, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/404 (2006.01); H01L 27/108 (2006.01); H01L 49/02 (2006.01); G11C 11/4074 (2006.01); G11C 7/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10814 (2013.01); G11C 7/02 (2013.01); G11C 11/4074 (2013.01); H01L 27/10823 (2013.01); H01L 27/10852 (2013.01); H01L 27/10876 (2013.01); H01L 27/10885 (2013.01); H01L 27/10891 (2013.01); H01L 27/10897 (2013.01); H01L 28/90 (2013.01); G11C 11/404 (2013.01); H01L 27/10855 (2013.01);
Abstract

A semiconductor memory device includes a substrate, plural gates, plural cell plugs, a capacitor structure and a stacked structure. The gates are disposed in the substrate, and the cell plugs are disposed on the substrate, to electrically connect the substrate at two sides of each gate. The capacitor structure includes plural capacitors, and each capacitor is electrically connected each cell plug. The stacked structure covers the capacitor structure, and the stacked structure includes a semiconductor layer, a conductive layer on the semiconductor layer and an insulating layer stacked on the conductive layer. Two gaps are defined respectively between a side portion of the insulating layer and a lateral portion of the conductive layer at two sides of the capacitor structure, and the two gaps have different lengths.


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