The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Jan. 19, 2017
Applicant:
Intevac, Inc., Santa Clara, CA (US);
Inventors:
Terry Bluck, Santa Clara, CA (US);
Babak Adibi, Los Altos, CA (US);
Vinay Prabhakar, Cupertino, CA (US);
William Eugene Runstadler, Jr., Livermore, CA (US);
Assignee:
INTEVAC, INC., Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); H01L 21/67288 (2013.01); H01L 21/6831 (2013.01); H01L 21/6875 (2013.01); H01L 21/68735 (2013.01); H01L 22/12 (2013.01);
Abstract
A chuck for wafer processing that counters the deleterious effects of thermal expansion of the wafer. Also, a combination of chuck and shadow mask arrangement that maintains relative alignment between openings in the mask and the wafer in spite of thermal expansion of the wafer. A method for fabricating a solar cell by ion implant, while maintaining relative alignment of the implanted features during thermal expansion of the wafer.