The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2019

Filed:

Jul. 23, 2018
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Nitesh Pandey, Eindhoven, NL;

Maxim Pisarenco, Son en Breugel, NL;

Alessandro Polo, Delft, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01); G01N 29/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70625 (2013.01); G01N 21/95607 (2013.01); G01N 29/0681 (2013.01); G03F 7/70633 (2013.01); G03F 7/70666 (2013.01);
Abstract

A method and apparatus to measure overlay from images of metrology targets, images obtained using acoustic waves, for example images obtained using an acoustic microscope. The images of two targets are obtained, one image using acoustic waves and one image using optical waves, the edges of the images are determined and overlay between the two targets is obtained as the difference between the edges of the two images.


Find Patent Forward Citations

Loading…