The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Sep. 18, 2018
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Guowei Xu, Ballston Lake, NY (US);

Hui Zang, Guilderland, NY (US);

Haiting Wang, Clifton Park, NY (US);

Yue Zhong, Ballston Lake, NY (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01); H01L 21/8234 (2006.01); H01L 27/02 (2006.01); H01L 27/088 (2006.01); H01L 21/311 (2006.01); H01L 29/66 (2006.01); H01L 21/3213 (2006.01); H01L 21/3105 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823437 (2013.01); H01L 21/31111 (2013.01); H01L 21/32133 (2013.01); H01L 21/823431 (2013.01); H01L 27/0207 (2013.01); H01L 27/0886 (2013.01); H01L 29/66545 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/0274 (2013.01); H01L 21/02164 (2013.01); H01L 21/31053 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01);
Abstract

One illustrative integrated circuit product disclosed herein includes a first final gate structure for a first transistor device, a second final gate structure for a second transistor device, the first and second transistors having a gate width direction and a gate length direction that is substantially normal to the gate width direction, and an insulating gate separation structure positioned between the first and second final gate structures, the insulating gate separation structure comprising an upper portion and a lower portion, the lower portion having a first lateral width in the gate width direction that is substantially uniform throughout a vertical height of the lower portion, the upper portion having a substantially uniform second lateral width in the gate width direction that is substantially uniform throughout a vertical height of the upper portion, wherein the second lateral width is less than the first lateral width.


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