The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2019

Filed:

Jan. 10, 2018
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Bipul C. Paul, Mechanicville, NY (US);

Ruilong Xie, Niskayuna, NY (US);

Puneet Harischandra Suvarna, Menands, NY (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 29/417 (2006.01); H01L 29/06 (2006.01); H01L 27/092 (2006.01); H01L 21/8238 (2006.01); H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
H01L 29/41733 (2013.01); H01L 21/823821 (2013.01); H01L 21/823871 (2013.01); H01L 21/823878 (2013.01); H01L 23/481 (2013.01); H01L 27/0924 (2013.01); H01L 29/0653 (2013.01); H01L 29/0665 (2013.01);
Abstract

Structures and circuits including multiple nanosheet field-effect transistors and methods of forming such structures and circuits. A complementary field-effect transistor includes a first nanosheet transistor with a source/drain region and a second nanosheet transistor with a source/drain region stacked over the source/drain region of the first nanosheet transistor. A contact extends vertically to connect the source/drain region of the first nanosheet transistor of the complementary field-effect transistor and the source/drain region of the second nanosheet transistor of the complementary field-effect transistor.


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