The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
May. 10, 2018
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Jiehui Shu, Clifton Park, NY (US);
Garo Jacques Derderian, Saratoga Springs, NY (US);
Hui Zang, Guilderland, NY (US);
John Zhang, Altamont, NY (US);
Haigou Huang, Rexford, NY (US);
Jinping Liu, Ballston Lake, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/762 (2006.01); H01L 21/8238 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 27/092 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76224 (2013.01); H01L 21/0228 (2013.01); H01L 21/02167 (2013.01); H01L 21/02282 (2013.01); H01L 21/823431 (2013.01); H01L 21/823821 (2013.01); H01L 27/0886 (2013.01); H01L 27/0924 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01);
Abstract
At least one method, apparatus and system providing semiconductor devices with relatively short gate heights but without a relatively high risk of contact-to-gate shorts. In embodiments, the method, apparatus, and system may provide contact formation by way of self-aligned contact processes.