The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Dec. 08, 2016
Asml Netherlands B.v., Veldhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Veldhoven, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Johannes Cornelis Paulus Melman, Oisterwijk, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Miao Yu, Best, NL;
Cornelius Maria Rops, Waalre, NL;
Ruud Olieslagers, Geldrop, NL;
Artunç Ulucan, Eindhoven, NL;
Theodorus Wilhelmus Polet, Geldrop, NL;
Patrick Johannes Wilhelmus Spruytenburg, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.