The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Nov. 30, 2016
Cymer, Llc, San Diego, CA (US);
Asml Netherlands B.v., Veldhoven, NL;
Willard Earl Conley, San Diego, CA (US);
Wei-An Hsieh, Taipei, TW;
Tsann-Bim Chiou, Hsinchu, TW;
Cheng-Hsien Hsieh, Taipei, TW;
ASML NETHERLANDS B.V., Veldhoven, NL;
CYMER, LLC, San Diego, CA (US);
Abstract
A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied; wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.