The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2019

Filed:

Feb. 24, 2016
Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Katsuhiko Hieda, Tokyo, JP;

Tsutomu Shimokawa, Tokyo, JP;

Hiroto Kubo, Tokyo, JP;

Takashi Doi, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 43/00 (2006.01); C12N 1/02 (2006.01); C12M 1/26 (2006.01); C08J 5/18 (2006.01); C08K 5/23 (2006.01); C08K 5/28 (2006.01); C12N 5/071 (2010.01); C12M 1/12 (2006.01); H01L 21/302 (2006.01); C12M 1/00 (2006.01);
U.S. Cl.
CPC ...
C12N 1/02 (2013.01); B32B 43/006 (2013.01); C08J 5/18 (2013.01); C08K 5/235 (2013.01); C08K 5/28 (2013.01); C12M 25/06 (2013.01); C12M 33/00 (2013.01); C12N 5/0625 (2013.01); H01L 21/302 (2013.01); C08J 2333/02 (2013.01); C12M 23/20 (2013.01); Y10T 156/1147 (2015.01);
Abstract

The invention is an adherend recovery method capable of recovering adherends such as cells no matter the types of adherends. An adherend recovery method for recovering an adherend from a support includes exposing a stack disposed on the support, the stack including a photosensitive gas generation layer, an adhesive layer and the adherend in this order on the support, generating a gas from the photosensitive gas generation layer by the exposure to separate the support and the stack from each other by the action of the gas, and recovering the adherend from the support by recovering the stack separated.


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