The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2019
Filed:
Aug. 11, 2017
Tokyo Electron Limited, Tokyo, JP;
Anton J. deVilliers, Clifton Park, NY (US);
Rodney L. Robison, East Berne, NY (US);
Ronald Nasman, Averill Park, NY (US);
David Travis, Albany, NY (US);
James Grootegoed, Wynantskill, NY (US);
Norman A. Jacobson, Jr., Scotia, NY (US);
Lior Huli, Delmar, NY (US);
Joshua S. Hooge, Austin, TX (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.