The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Jul. 08, 2016
Applicant:

Pivotal Systems Corporation, Fremont, CA (US);

Inventors:

Joseph R. Monkowski, Danville, CA (US);

James Franklin, San Francisco, CA (US);

Jiuyi Cheng, Milpitas, CA (US);

Tao Ding, San Leandro, CA (US);

Andrey Shmakov, San Francisco, CA (US);

Travis Owens, Fremont, CA (US);

Assignee:

PIVOTAL SYSTEMS CORPORATION, Fremont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F16K 31/02 (2006.01); G01F 1/34 (2006.01); G05D 7/06 (2006.01);
U.S. Cl.
CPC ...
G01F 1/34 (2013.01); G05D 7/0635 (2013.01);
Abstract

An apparatus for controlling the flow of a gas, containing a controllable valve, wherein the position of the valve and the gas pressure upstream of the valve are measured and used in conjunction with a first lookup table to determine the flow rate of the gas through the valve; and a flow restrictor upstream of the controllable valve, wherein the temperature of the flow restrictor and the gas pressure upstream and downstream of the flow restrictor are measured and used in conjunction with a second lookup table to determine the flow rate of the gas through the flow restrictor.


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