The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Jan. 24, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Edward P. Hammond, IV, Hillsborough, CA (US);
Tsutomu Tanaka, Santa Clara, CA (US);
Anantha K. Subramani, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/00 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01L 21/3065 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32091 (2013.01); C23C 16/45525 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32174 (2013.01); H01J 37/32532 (2013.01); H01J 37/32577 (2013.01); H01L 21/67069 (2013.01); H01J 2237/334 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/31138 (2013.01); H01L 21/32136 (2013.01);
Abstract
A plasma source assembly for use with a processing chamber includes an inner RF feed connected to the inner edge of the electrode and an outer RF feed connected to the outer edge of the electrode. A capacitor is connected between the inner edge of the electrode and electrical ground to modulate the voltage of across the length of the electrode.