The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Jul. 12, 2016
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Christopher Dennis Bencher, Cupertino, CA (US);
Joseph R. Johnson, Redwood City, CA (US);
Dave Markle, Pleasanton, CA (US);
Mehdi Vaez-Iravani, Los Gatos, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 27/28 (2006.01); G02B 26/08 (2006.01); G02B 5/30 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70291 (2013.01); G02B 27/283 (2013.01); G03F 7/2008 (2013.01); G03F 7/2057 (2013.01); G03F 7/70566 (2013.01); G02B 5/3083 (2013.01); G02B 26/0833 (2013.01); G02F 1/1303 (2013.01);
Abstract
The present disclosure provides a method for producing an image on a substrate. The method includes providing a single beam of light to a multiple DMD assembly, splitting the single beam of light into an s-polarization beam and a p-polarization beam, and reflecting the s-polarization beam and the p-polarization beam through the multiple DMD assembly such that the multiple DMD assembly produces a plurality of superimposed images on the substrate.