The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Oct. 27, 2015
Nissan Chemical Industries, Ltd., Tokyo, JP;
Keisuke Hashimoto, Funabashi, JP;
Rikimaru Sakamoto, Funabashi, JP;
Hirokazu Nishimaki, Funabashi, JP;
Takafumi Endo, Funabashi, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent, wherein each of Rto Ris independently hydrogen atom or methyl group, and Xis divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein Xin Formula (1) is organic group of Formula (2), wherein Ais phenylene group or naphthylene group, Ais phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and wherein each of Aand Ais independently phenylene group or naphthylene group, and dotted line is bond.