The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2019

Filed:

Apr. 26, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Seyed Iman Mossavat, Waalre, NL;

Adriaan Johan Van Leest, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/66 (2006.01); B29C 67/00 (2017.01); G03F 7/20 (2006.01); G05B 19/4099 (2006.01); B29C 64/386 (2017.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B29C 67/0088 (2013.01); B29C 64/386 (2017.08); G03F 7/705 (2013.01); G03F 7/70625 (2013.01); G05B 19/4099 (2013.01); B33Y 50/02 (2014.12); G05B 2219/35134 (2013.01); G05B 2219/49007 (2013.01);
Abstract

Disclosed are a method, computer program and associated apparatuses for metrology. The method includes acquiring inspection data comprising a plurality of inspection data elements, each inspection data element having been obtained by inspection of a corresponding target structure formed using a lithographic process; and performing an unsupervised cluster analysis on said inspection data, thereby partitioning said inspection data into a plurality of clusters in accordance with a metric. In an embodiment, a cluster representative can be identified for each cluster. The cluster representative may be reconstructed and the reconstruction used to approximate the other members of the cluster.


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