The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2019

Filed:

Aug. 26, 2016
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Shabnam Ghadar, Sunnyvale, CA (US);

Sina Jahanbin, San Jose, CA (US);

Himanshu Vajaria, San Jose, CA (US);

Bradley Ries, San Jose, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/408 (2006.01); G06N 5/02 (2006.01); G05B 19/418 (2006.01); H01L 21/66 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G06N 20/00 (2019.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01); G05B 2219/37224 (2013.01); Y02P 90/22 (2015.11);
Abstract

Feature extraction and classification is used for process window monitoring. A classifier, based on combinations of metrics of masked die images and including a set of significant combinations of one or more segment masks, metrics, and wafer images, is capable of detecting a process non-compliance. A process status can be determined using a classifier based on calculated metrics. The classifier may learn from nominal data.


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