The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2019

Filed:

Jul. 17, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Takashi Ando, Tuckahoe, NY (US);

Hiroyuki Miyazoe, White Plains, NY (US);

Iqbal R. Saraf, Cobleskill, NY (US);

Shyng-Tsong Chen, Rensselaer, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/24 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1253 (2013.01); H01L 27/2436 (2013.01); H01L 45/1233 (2013.01); H01L 45/146 (2013.01); H01L 45/1608 (2013.01); H01L 45/1675 (2013.01);
Abstract

A method is presented for protecting resistive random access memory (RRAM) stacks within a resistive memory crossbar array. The method includes forming conductive lines within an interlayer dielectric (ILD), forming a metal nitride layer over at least one conductive line, forming a bottom electrode, forming a RRAM stack over the metal nitride layer, the RRAM stack including a first top electrode and a second top electrode, undercutting the second top electrode to define recesses, and filling the recesses with inner spacers.


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