The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Dec. 28, 2017
International Business Machines Corporation, Armonk, NY (US);
Gauri Karve, Cohoes, NY (US);
Fee Li Lie, Albany, NY (US);
Indira Seshadri, Niskayuna, NY (US);
Mona Ebrish, Albany, NY (US);
Leigh Anne H. Clevenger, Rhinebeck, NY (US);
Ekmini A. De Silva, Slingerlands, NY (US);
Nicole A. Saulnier, Albany, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for forming a device with multiple gate lengths includes forming a gate stack on vertical fins. A cutting mask formed on the gate stack is etched to include two or more different heights. Gate structures with two or more gate lengths are etched by employing the two or more different heights in the cutting mask as an etch mask. The cutting mask is removed. A top source/drain regions is formed on top of the vertical fins.