The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2019

Filed:

Jun. 29, 2011
Applicants:

Satoshi Torimi, Kanonji, JP;

Satoru Nogami, Kanonji, JP;

Tsuyoshi Matsumoto, Kanonji, JP;

Inventors:

Satoshi Torimi, Kanonji, JP;

Satoru Nogami, Kanonji, JP;

Tsuyoshi Matsumoto, Kanonji, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 19/12 (2006.01); C30B 29/36 (2006.01); C30B 28/14 (2006.01);
U.S. Cl.
CPC ...
C30B 19/12 (2013.01); C30B 28/14 (2013.01); C30B 29/36 (2013.01); Y10T 428/26 (2015.01);
Abstract

Provided is an inexpensive seed material for liquid phase epitaxial growth of silicon carbide. A seed materialfor liquid phase epitaxial growth of a monocrystalline silicon carbide includes a surface layer containing a polycrystalline silicon carbide with a 3C crystal polymorph. Upon X-ray diffraction of the surface layer thereof, a first-order diffraction peak corresponding to a (111) crystal plane is observed as a diffraction peak corresponding to the polycrystalline silicon carbide with a 3C crystal polymorph but no other first-order diffraction peak having a diffraction intensity of 10% or more of the diffraction intensity of the first-order diffraction peak corresponding to the (111) crystal plane is observed.


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