The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Mar. 22, 2018
Entegris, Inc., Billerica, MA (US);
Oleg Byl, Southbury, CT (US);
Edward A. Sturm, New Milford, CT (US);
Ying Tang, Brookfield, CT (US);
Sharad N. Yedave, Danbury, CT (US);
Joseph D. Sweeney, New Milford, CT (US);
Steven G. Sergi, Woodbury, CT (US);
Barry Lewis Chambers, Midlothian, CT (US);
Entegris, Inc., Billerica, MA (US);
Abstract
Ion implantation processes and systems are described, in which carbon dopant source materials are utilized to effect carbon doping. Various gas mixtures are described, including a carbon dopant source material, as well as co-flow combinations of gases for such carbon doping. Provision of in situ cleaning agents in the carbon dopant source material is described, as well as specific combinations of carbon dopant source gases, hydride gases, fluoride gases, noble gases, oxide gases and other gases.