The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

Jun. 07, 2017
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Robert Haynes, Pleasanton, CA (US);

John Gerling, Livermore, CA (US);

Aron Welk, Tracy, CA (US);

Christopher Sears, Fremont, CA (US);

Felipe Fuks, Milpitas, CA (US);

Mehran Nasser-Ghodsi, Hamilton, MA (US);

Tomas Plettner, San Ramon, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/14 (2006.01); H01J 37/285 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1474 (2013.01); H01J 37/14 (2013.01); H01J 37/1471 (2013.01); H01J 37/18 (2013.01); H01J 37/285 (2013.01);
Abstract

A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.


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