The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Jul. 13, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Bob Streefkerk, Tilburg, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Roelof Frederik De Graaf, Veldhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Michel Riepen, Bergschenhoek, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01);
Abstract
An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.