The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Nov. 22, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Jochen Hetzler, Aalen, DE;
Sebastian Fuchs, Aalen, DE;
Hans-Michael Stiepan, Aalen, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A measurement arrangement () and an associated method for interferometrically determining the surface shape () of a test object () includes a light source () providing an input wave () and a diffractive optical element (). The diffractive optical element is configured to produce in each case by way of diffraction from the input wave a test wave (), which is directed at the test object () and has a wavefront that is adapted at least partially to a desired shape of the optical surface, and a reference wave (). The measurement arrangement furthermore includes a reflective optical element () that back-reflects the reference wave () and a capture device () that captures an interferogram produced by superposing the test wave after interaction with the test object and the back-reflected reference wave (), in each case after a further diffraction at the diffractive optical element in a capture plane ().