The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
Jan. 29, 2015
Asml Netherlands B.v., Veldhoven, NL;
Henricus Wilhelmus Maria Van Buel, 's-Hertogenbosch, NL;
Johannes Marcus Maria Beltman, Knegsel, NL;
Xing Lan Liu, Veldhoven, NL;
Hendrik Jan Hidde Smilde, Veldhoven, NL;
Richard Johannes Franciscus Van Haren, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of devising a target arrangement, and associated target and reticle. The target includes a plurality of gratings, each grating having a plurality of substructures. The method includes: defining a target area; locating the substructures within the target area so as to form the gratings; and locating assist features at the periphery of the gratings, the assist features being configured to reduce measured intensity peaks at the periphery of the gratings. The method may include an optimization process including modelling a resultant image obtained by inspection of the target using a metrology process; and evaluating whether the target arrangement is optimized for detection using a metrology process.