The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
Dec. 21, 2017
Globalwafers Japan Co., Ltd., Niigata, JP;
Satoko Nakagawa, Tokyo, JP;
Yuta Nagai, Tokyo, JP;
GlobalWafers Japan Co., Ltd., Niigata, JP;
Abstract
A carbon concentration can be measured using a small number of calibration curves even for a silicon wafer containing oxygen at a high concentration. A calibration curve determination method includes determining calibration curves using data sets each including a plurality of data, each data including irradiation dose, oxygen concentration, carbon concentration, and luminescence intensity, the data of each data set having the same irradiation dose and the same oxygen concentration, and the data sets being different in at least one of the irradiation dose and the oxygen concentration, selecting one or more combinations each being a pair of the calibration curves which are equal to each other in the irradiation dose and different from each other in the oxygen concentration, and obtaining a difference between slopes of the paired calibration curves on a log-log plot for each combination.