The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Jan. 10, 2014
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
David Foord, Portland, OR (US);
Chad Rue, Portland, OR (US);
Assignee:
FEI COMPANY, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 59/44 (2006.01); H01J 37/305 (2006.01); H01J 37/317 (2006.01); G01N 1/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3056 (2013.01); G01N 1/32 (2013.01); H01J 37/3171 (2013.01); H01J 2237/31713 (2013.01); H01J 2237/31745 (2013.01); H01J 2237/31749 (2013.01); Y10T 428/24479 (2015.01);
Abstract
Implanting a material in a pattern hardens the material in the pattern for subsequent etching. When the region is etched, by ion beam sputtering, chemically enhanced charged particle beam etching, or chemical etching, a thicker structure remains because of the reduced etch rate of the hardened pattern. The invention is particularly useful for the preparation of thin lamella for viewing on a transmission electron microscope.