The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Mar. 09, 2018
Hitachi, Ltd., Chiyoda-ku, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
To reduce the risk of measurement accuracy degradation and information lost due to adhesion of contamination that occurs by irradiation with charged particle beam. The charged particle beam device includes: a deflector for scanning a charged particle beam; a detector for detecting secondary charged particles generated by the interaction of the charged particle beam with a sample; and a system control unit including a calculation part, a measurement part, and a storage part. The measurement part measures a feature amount from an image formed based on a signal output from the detector after a charged particle beam is scanned on the sample by the deflector (S). The calculation part calculates an amount of contamination adhering to a surface of the sample by irradiation of the sample with the charged particle beam, from a change in the feature amount measured by the measurement part (S). Then, the storage part adds the information of the contamination amount to the image and stores the image information (S).