The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2019

Filed:

Mar. 23, 2015
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Wei-Che Hsieh, New Taipei, TW;

Brian Wang, Hsinchu County, TW;

Tze-Liang Lee, Hsinchu, TW;

Yi-Hung Lin, Taipei, TW;

Hao-Ming Lien, Hsinchu, TW;

Shiang-Rung Tsai, Hsinchu, TW;

Tai-Chun Huang, Hsinchu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01L 21/00 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45578 (2013.01); C23C 16/4584 (2013.01); C23C 16/45504 (2013.01); C23C 16/45546 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01); H01L 21/00 (2013.01);
Abstract

An injector for forming films respectively on a stack of wafers is provided. The injector includes a plurality of hole structures. Every adjacent two of the wafers have therebetween a wafer spacing, and each of the wafers has a working surface. The hole structures respectively correspond to the respective wafer spacings. The working surface and a respective hole structure have therebetween a parallel distance. The parallel distance is larger than a half of the wafer spacing. A wafer processing apparatus and a method for forming films respectively on a stack of wafers are also provided.


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