The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Jan. 15, 2016
Applicant:

Synopsys, Inc., Mountain View, CA (US);

Inventors:

Yuli Xue, Shanghai, CN;

Weiping Fang, Fremont, CA (US);

John Robert Studders, Raleigh, NC (US);

Byungwook Kim, Los Altos Hills, CA (US);

Assignee:

SYNOPSYS, INC., Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); H01L 21/84 (2006.01); G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G03F 1/00 (2013.01); H01L 21/845 (2013.01); G06F 2217/12 (2013.01); H01L 21/84 (2013.01); Y02P 90/265 (2015.11);
Abstract

A computer-implemented method for validating a design characterized by a multi-patterning layer is presented. The method includes receiving the multi-patterning layer in a memory of the computer when the computer is invoked to validate the design. The method further includes correcting, using the computer, a first error in a first shape of the multi-patterning layer in accordance with a first rule thereby forming a corrected layer. The method further includes incrementally validating, using the computer, a first portion of the corrected layer in accordance with the first error and a first connected component of a first graph associated with the multi-patterning layer.


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