The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Feb. 08, 2016
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Martin Hermann, Heidenheim, DE;
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G02B 5/20 (2006.01); F21V 9/04 (2018.01); F21V 9/06 (2018.01); G03F 7/20 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); G02B 5/0816 (2013.01); G02B 5/0891 (2013.01); G03F 7/70316 (2013.01); G03F 7/70958 (2013.01); G21K 1/062 (2013.01);
Abstract
A mirror (), more particularly for a microlithographic projection exposure apparatus, has an optical effective surface (), a mirror substrate () and a reflection layer stack () for reflecting electromagnetic radiation impinging on the optical effective surface (), wherein a layer () composed of a group III nitride is arranged between the mirror substrate () and the reflection layer stack (), wherein the group III nitride is selected from the group containing gallium nitride (GaN), aluminum nitride (AlN) and aluminum gallium nitride (AlGaN).