The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Jun. 15, 2017
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Jochen Hetzler, Aalen, DE;
Aksel Goehnermeier, Essingen-Lauterburg, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01B 11/14 (2006.01); G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7003 (2013.01); G01B 9/02015 (2013.01); G01B 11/14 (2013.01); G03F 7/7085 (2013.01); G03F 7/70483 (2013.01); G03F 7/70616 (2013.01); G03F 7/70675 (2013.01); G03F 7/70683 (2013.01); G03F 7/70733 (2013.01); G03F 9/7049 (2013.01); G01B 2290/65 (2013.01);
Abstract
A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.