The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Dec. 15, 2017
Applicant:

Versum Materials Us, Llc, Tempe, AZ (US);

Inventors:

Alan Charles Cooper, Macungie, PA (US);

Sergei Vladimirovich Ivanov, Schnecksville, PA (US);

Moo-Sung Kim, Gyunggi-do, KR;

Assignee:

VERSUM MATERIALS US, LLC, Tempe, AZ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/16 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01); H01L 21/285 (2006.01); H01L 21/02 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7685 (2013.01); C23C 16/16 (2013.01); C23C 16/45553 (2013.01); H01L 21/02068 (2013.01); H01L 21/28556 (2013.01); H01L 21/28562 (2013.01); H01L 21/28568 (2013.01); H01L 21/76849 (2013.01); H01L 23/53209 (2013.01); H01L 23/53238 (2013.01); H01L 21/76843 (2013.01);
Abstract

Described herein are cobalt compounds, processes for making cobalt compounds, cobalt compounds used as precursors for depositing cobalt-containing films (e.g., cobalt, cobalt oxide, cobalt nitride, cobalt silicide etc.); and cobalt films. Examples of cobalt precursor compounds are (disubstituted alkyne) dicobalt hexacarbonyl compounds. Examples of surfaces for deposition of metal-containing films include, but are not limited to, metals, metal oxides, metal nitrides, and metal silicides. Disubstituted alkyne ligands with alkyl groups such as linear alkyls and branched alkyls to form cobalt complexes which are used for selective deposition on certain surfaces and/or superior film properties such as uniformity, continuity, and low resistance.


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